Design Rules The layout, dimensions, and spacing of a semiconductor device or integrated circuit (IC) must follow a set of…
Author: siliconvlsi
CMOS Fabrication Steps A typical CMOS (Complementary Metal-Oxide-Semiconductor) semiconductor manufacturing process involves several key steps, each with a specific purpose.…
Chemical-mechanical planarization (CMP) is a crucial step in modern CMOS semiconductor processes for achieving a flat and even semiconductor surface.…
Wet etching and dry (plasma) etching are two distinct techniques used in semiconductor fabrication for selectively patterning materials. They have…
In CMOS (Complementary Metal-Oxide-Semiconductor) manufacturing, various materials play crucial roles, and specific deposition techniques are employed to apply these materials…
Integrated circuit manufacturing often requires altering the dopant concentration in specific regions of semiconductor materials. This alteration is essential for…
Fan-out and its Impact Fan-out refers to the number of load gates (usually denoted as “N”) connected to the output…
Noise Margins Noise margins play a crucial role in ensuring the reliability and robustness of digital gates within a circuit,…
Voltage Transfer Characteristic (VTC) The voltage-transfer characteristic (VTC) is a crucial representation of a gate’s electrical behavior in digital circuits,…
Noise Noise presents a notable challenge in the design of digital circuits due to its potential to disrupt the intended…